Tables to Subpart SSSSS of Part 63

Table 1 to Subpart SSSSS of Part 63.—Emission Limits [As stated in § 63.9788, you must comply with the emission limits for affected sources in the following table:]For . . .You must meet the following emission limits . . .1. Each new or existing curing oven, shape dryer, and kiln that is used to process refractory products that use organic HAP; each new or existing coking oven and defumer that is used to produce pitch-impregnated refractory products; each new shape preheater that is used to produce pitch-impregnated refractory products; AND each new or existing process unit that is exhausted to a thermal or catalytic oxidizer that also controls emissions from an affected shape preheater or pitch working tankAs specified in items 2 through 9 of this table.2. Continuous process units that are controlled with a thermal or catalytic oxidizera. The 3-hour block average THC concentration must not exceed 20 parts per million by volume, dry basis (ppmvd), corrected to 18 percent oxygen, at the outlet of the control device; orb. The 3-hour block average THC mass emissions rate must be reduced by at least 95 percent.3. Continuous process units that are equipped with a control device other than a thermal or catalytic oxidizera. The 3-hour block average THC concentration must not exceed 20 ppmvd, corrected to 18 percent oxygen, at the outlet of the control device; orb. The 3-hour block average THC mass emissions rate must be reduced by at least 95 percent.4. Continuous process units that use process changes to reduce organic HAP emissionsThe 3-hour block average THC concentration must not exceed 20 ppmvd, corrected to 18 percent oxygen, at the outlet of the process gas stream.5. Continuous kilns that are not equipped with a control deviceThe 3-hour block average THC concentration must not exceed 20 ppmvd, corrected to 18 percent oxygen, at the outlet of the process gas stream.6. Batch process units that are controlled with a thermal or catalytic oxidizera. The 2-run block average THC concentration for the 3-hour peak emissions period must not exceed 20 ppmvd, corrected to 18 percent oxygen, at the outlet of the control device; orb. The 2-run block average THC mass emissions rate for the 3-hour peak emissions period must be reduced by at least 95 percent.7. Batch process units that are equipped with a control device other than a thermal or catalytic oxidizera. The 2-run block average THC concentration for the 3-hour peak emissions period must not exceed 20 ppmvd, corrected to 18 percent oxygen, at the outlet of the control device; orb. The 2-run block average THC mass emissions rate for the 3-hour peak emissions period must be reduced by at least 95 percent.8. Batch process units that use process changes to reduce organic HAP emissionsThe 2-run block average THC concentration for the 3-hour peak emissions period must not exceed 20 ppmvd, corrected to 18 percent oxygen, at the outlet of the process gas stream.9. Batch process kilns that are not equipped with a control deviceThe 2-run block average THC concentration for the 3-hour peak emissions period must not exceed 20 ppmvd, corrected to 18 percent oxygen, at the outlet of the process gas stream.10. Each new continuous kiln that is used to produce clay refractory productsa. The 3-hour block average HF emissions must not exceed 0.019 kilograms per megagram (kg/Mg) (0.038 pounds per ton (lb/ton)) of uncalcined clay processed, OR the 3-hour block average HF mass emissions rate must be reduced by at least 90 percent; andb. The 3-hour block average HCl emissions must not exceed 0.091 kg/Mg (0.18 lb/ton) of uncalcined clay processed, OR the 3-hour block average HCl mass emissions rate must be reduced by at least 30 percent.11. Each new batch process kiln that is used to produce clay refractory productsa. The 2-run block average HF mass emissions rate for the 3-hour peak emissions period must be reduced by at least 90 percent; andb. The 2-run block average HCl mass emissions rate for the 3-hour peak emissions period must be reduced by at least 30 percent.