§ 98.90 - Definition of the source category.

§ 98.91 - Reporting threshold.

§ 98.92 - GHGs to report.

§ 98.93 - Calculating GHG emissions.

§ 98.94 - Monitoring and QA/QC requirements.

§ 98.95 - Procedures for estimating missing data.

§ 98.96 - Data reporting requirements.

§ 98.97 - Records that must be retained.

§ 98.98 - Definitions.

Table I-1 to Subpart I - Default Emission Factors for Threshold Applicability Determination

Table I-2 to Subpart I - Examples of Fluorinated GHGs and Fluorinated Heat Transfer Fluids Used by the Electronics Industry

Table I-4 to Subpart I - Table I-4 to Subpart I of Part 98-Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for 300 mm Wafer Size

Table I-5 to Subpart I - Table I-5 to Subpart I of Part 98-Table I-5 to Subpart I of Part 98 - Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for MEMS Manufacturing

Table I-6 to Subpart I - Table I-6 to Subpart I of Part 98-Table I-6 to Subpart I of Part 98 - Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for LCD Manufacturing

Table I-7 to Subpart I - Table I-7 to Subpart I of Part 98-Table I-7 to Subpart I of Part 98 - Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for PV Manufacturing

Table I-8 to Subpart I - Table I-8 to Subpart I of Part 98-Table I-8 to Subpart I of Part 98 - Default Emission Factors (1-UN2O j) for N2O Utilization (UN2O j)

Table 1-3 to Subpart I of Part 98 - Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for 150 mm and 200 mm Wafer Sizes

Table I-1 to Subpart I of Part 98 - —Default Emission Factors for Threshold Applicability Determination

Table I-10 to Subpart I of Part 98 - Maximum Field Detection Limits Applicable to Fluorinated GHG Concentration Measurements for Stack Systems

Table I-11 to Subpart I of Part 98 - —Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for Use With the Stack Test Method (150 mm and 200 mm Wafers)

Table I-12 to Subpart I of Part 98 - —Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for Use With the Stack Test Method (300 mm and 450 mm Wafers)

Table I-13 to Subpart I of Part 98 - Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for LCD Manufacturing for Use With the Stack Test Method

Table I-14 to Subpart I of Part 98 - Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for PV Manufacturing for Use With the Stack Test Method

Table I-15 to Subpart I of Part 98 - Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for MEMS Manufacturing for Use With the Stack Test Method

Table I-16 to Subpart I of Part 98 - —Default Emission Destruction or Removal Efficiency (DRE) Factors for Electronics Manufacturing

Table I-17 to Subpart I of Part 98 - —Expected and Possible By-Products for Electronics Manufacturing

Table I-2 to Subpart I of Part 98 - —Examples of Fluorinated GHGs Used by the Electronics Industry

Table I-3 to Subpart I of Part 98 - —Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for 150 mm and 200 mm Wafer Sizes

Table I-4 to Subpart I of Part 98 - — Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for 300 mm and 450 mm Wafer Size

Table I-5 to Subpart I of Part 98 - Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for MEMS Manufacturing

Table I-6 to Subpart I of Part 98 - Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for LCD Manufacturing

Table I-8 to Subpart I of Part 98 - — Default Emission Factors (1-UN2O,j) for N2O Utilization (UN2O,j)

Table I-9 to Subpart I of Part 98 - Methods and Procedures for Conducting Emissions Test for Stack Systems

Table I-18 to Subpart I of Part 98 - XXX

Table I-19 to Subpart I of Part 98 - XXX

Table I-20 to Subpart I of Part 98 - XXX

Table I-21 to Subpart I of Part 98 - XXX

Table I-7 To Subpart I of Part 98 - Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for PV Manufacturing

Appendix A to Subpart I of Part 98 - Alternative Procedures for Measuring Point-of-Use Abatement Device Destruction or Removal Efficiency