2015-05549. Mandatory Greenhouse Gas Reporting

CFR Correction

In Title 40 of the Code of Federal Regulations, Parts 96 to 99, revised as of July 1, 2014, on pages 696 through 698, in subpart I of part 98, tables I-5 through I-7 are corrected to read as follows:

Table I-5 To Subpart I of Part 98—Default Emission Factors (1-U_ij) for Gas Utilization Rates (U_ij) and By-Product Formation Rates (B_ijk) for MEMS Manufacturing

Process type factors	Process gas i
	CF4	C2 F6	CHF3	CH2 F2	C3 F8	c− C4 F8	NF3 Remote	NF3	SF6	C4 F6a	C5 F8a	C4 F8 Oa
Etch 1-Ui	0.7	1 0.4	1 0.4	1 0.06	NA	1 0.2	NA	0.2	0.2	0.1	0.2	NA
Etch BCF4	NA	1 0.4	1 0.07	1 0.08	NA	0.2	NA	NA	NA	1 0.3	0.2	NA
Etch BC2 F6	NA	NA	NA	NA	NA	0.2	NA	NA	NA	1 0.2	0.2	NA
CVD Chamber Cleaning 1-Ui	0.9	0.6	NA	NA	0.4	0.1	0.02	0.2	NA	NA	0.1	0.1
CVD Chamber Cleaning BCF4	NA	0.1	NA	NA	0.1	0.1	2 0.02	2 0.1	NA	NA	0.1	0.1
CVD Chamber Cleaning BC3 F8	NA	NA	NA	NA	NA	NA	NA	NA	NA	NA	NA	0.4
Notes: NA = Not applicable; i.e., there are no applicable default emission factor measurements for this gas. This does not necessarily imply that a particular gas is not used in or emitted from a particular process sub-type or process type.
1 Estimate includes multi-gas etch processes.
2 Estimate reflects presence of low-k, carbide and multi-gas etch processes that may contain a C-containing fluorinated GHG additive.

Table I-6 To Subpart I of Part 98—Default Emission Factors (1-U_ij) for Gas Utilization Rates (U_ij) and By-Product Formation Rates (B_ijk) for LCD Manufacturing

Process type factors	Process gas i
	CF4	C2 F6	CHF3	CH2 F2	C3 F8	c− C4 F8	NF3 Remote	NF3	SF6
Etch 1-Ui	0.6	NA	0.2	NA	NA	0.1	NA	NA	0.3
Etch BCF4	NA	NA	0.07	NA	NA	0.009	NA	NA	NA
Etch BCHF3	NA	NA	NA	NA	NA	0.02	NA	NA	NA
Etch BC2 F4	NA	NA	0.05	NA	NA	NA	NA	NA	NA
CVD Chamber Cleaning 1-Ui	NA	NA	NA	NA	NA	NA	0.03	0.3	0.9
Notes: NA = Not applicable; i.e., there are no applicable default emission factor measurements for this gas. This does not necessarily imply that a particular gas is not used in or emitted from a particular process sub-type or process type.

Table I-7 To Subpart I of Part 98—Default Emission Factors (1-U_ij) for Gas Utilization Rates (U_ij) and By-Product Formation Rates (B_ijk) for PV Manufacturing

Process type factors	Process gas i
	CF4	C2 F6	CHF3	CH2 F2	C3 F8	c− C4 F8	NF3 Remote	NF3	SF6
Etch 1-Ui	0.7	0.4	0.4	NA	NA	0.2	NA	NA	0.4
Etch BCF4	NA	0.2	NA	NA	NA	0.1	NA	NA	NA
Etch BC2 F6	NA	NA	NA	NA	NA	0.1	NA	NA	NA
CVD Chamber Cleaning 1-Ui	NA	0.6	NA	NA	0.1	0.1	NA	0.3	0.4
CVD Chamber Cleaning BCF4	NA	0.2	NA	NA	0.2	0.1	NA	NA	NA
Notes: NA = Not applicable; i.e., there are no applicable default emission factor measurements for this gas. This does not necessarily imply that a particular gas is not used in or emitted from a particular process sub-type or process type.