[Federal Register Volume 64, Number 189 (Thursday, September 30, 1999)]
[Notices]
[Page 52771]
From the Federal Register Online via the Government Publishing Office [www.gpo.gov]
[FR Doc No: 99-25420]
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DEPARTMENT OF COMMERCE
National Institute of Standards and Technology
Government-Owned Inventions Available for Licensing
AGENCY: National Institute of Standards and Technology, Commerce.
ACTION: Notice of Government-owned inventions available for licensing.
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SUMMARY: The inventions listed below are owned in whole or in part by
the U.S. Government, as represented by the Department of Commerce. The
Department of Commerce's ownership interest in the inventions is
available for licensing in accordance with 35 U.S.C. 207 and 37 CFR
Part 404 to achieve expeditious commercialization of results of
Federally funded research and development.
FOR FURTHER INFORMATION CONTACT: Technical and licensing information on
these inventions may be obtained by writing to: National Institute of
Standards and Technology, Office of Technology Partnerships, Building
820, Room 213, Gaithersburg, MD 20899; Fax 301-869-2751. Any request
for information should include the NIST Docket No. and Title for the
relevant invention as indicated below.
SUPPLEMENTARY INFORMATION: NIST may enter into a Cooperative Research
and Development Agreement (``CRADA'') with the licensee to perform
further research on the inventions for purposes of commercializations.
The inventions available for licensing are:
NIST Docket Number: 95-036US.
Title: X-Ray Lithography Mask Inspection System.
Abstract: The invention is jointly owned by the U.S. Government, as
represented by the Secretary of Commerce, and Wisconsin Alumni Research
Foundation. The Department of Commerce's ownership interest in this
invention is available for nonexclusive licensing. The invention uses
an x-ray conversion microscope to form an enlarged image of the actual
x-ray pattern that an x-ray mask would project onto a resist. Present
x-ray mask inspection is done by electron microscopes where the image
produced is representative of the interaction of high energy electrons
with the features on the mask. The proposed technique would instead
form images from the x-ray transmission of the mask, the quantity most
relevant to the mask's performance in the x-ray lithography process.
NIST Docket Number: 96-045US.
Title: Electroenzymatic Reactor and Method for Enzymatic Catalysis.
Abstract: The invention is jointly owned by the U.S. Government, as
represented by the Secretary of Commerce, and the University of
California, Los Angeles. Interest in biocatlytic hydroxylation derives
from its ability to transform organic substrates having no functional
groups into oxygen-bearing compounds with high regio- or stereo-
selectivity. Use of redox enzymes in these syntheses is hampered by
intrinsic dependence on stoichiometric amounts of freely dissociated
cofactors, such as NADH and/or redox partner proteins, which supply
necessary reducing equivalents. Economic feasibility requires that
simple, regeneration can meet these requirements. Previously, a
bioelectrochemical process has been described in which electrons are
transferred directly (without mediators) between an electrode and
redox-active biological material, such as an enzyme or protein. In that
work, electron transfer was achieved using various modified metal or
graphite electrodes. Such processes suffer from either inefficiency
(low redox reaction rates) or rapid decline in activity due to
component fouling by proteins. In the present disclosure, the P450
enzymatic cycle, which requires a continuous supply of reducing
equivalents, molecular oxygen and an amendable organic substrate, is
utilized in an unique electroenzymatic reactor to catalyze the
generation of stereochemical hydroxylation products. The reactor
permits rapid and persistent electron transfer to a P450 protein
cofactor (putidaredoxin) by using certain tin oxide or iridium oxide
cathodes, while simultaneously providing necessary dissolved oxygen at
platinum or ruthenium oxide counter electrodes. The need for NADH and
the redox protein, flavin reductase, which are required in the native
cycle, has been eliminated.
NIST Docket Number: 96-048US.
Title: Surface Immobilization of Biopolymers.
Abstract: In one embodiment, the present invention provides a
biopolymer-containing monolayer comprising: thiol-derivatized
biopolymers and organic thiols bound to a metal substrate. In another
embodiment, the present invention provides a method for forming this
biopoly-containing monolayer. Preferably, the biopolymers are single-
stranded DNA probes.
NIST Docket Number: 98-024US.
Title: System for Stabilizing and Controlling a Hoisted Load.
Abstract: A load control method that can be adapted to single point
lift mechanisms such as boom cranes can precisely control the position,
velocity and force of a spreader bar or other tools in six degrees of
freedom. Winches can be controlled manually by a multi-axis joystick,
or can be automatically controlled by computer. Various combinations of
manual and automatic control can also be implemented. The invention has
application in preventing load pendulation during the off-loading of
cargo from ships in high seas and in improving safety in the handling
of loads in terrestrial applications.
NIST Docket Number: 99-008US.
Title: Test-Chip Carrier.
Abstract: The invention is jointly owned by the U.S. Government, as
represented by the Secretary of Commerce, and Sandia National
Laboratories. The Department of Commerce's ownership interest in this
invention is available for nonexclusive licensing. A test-chip carrier
includes a standard semiconductor wafer of single crystal material with
a crystallographic lattice on at least one major surface. A mask is
formed on the one major surface, including a coating of masking
material, and patterning the masking material to define a rectangularly
shaped test-chip receiving pit and one or more reference marks to
facilitate location of target reference features. The test-chip
receiving pit is positioned with one diagonal extending parallel to a
first crystallographic lattice vector/direction and another diagonal
extending parallel to a second crystallographic lattice vector/
direction, e.g. the (010) and (001) crystallographic vectors. The
semiconductor wafer is lattice-plans selective etched to form the test-
chip receiving pit and the one or more reference marks. A plurality of
pits can be formed if desired and a test-chip is mounted in each of the
pits to provide multiple calibration artifacts, failure analysis, or
product chip mounting.
Dated: September 23, 1999.
Karen Brown,
Deputy Director.
[FR Doc. 99-25420 Filed 9-29-99; 8:45 am]
BILLING CODE 3510-13-M
